Issue 5, 2007

Rapid fabrication of microchannels using microscale plasma activated templating (μPLAT) generated water molds

Abstract

Poly(dimethylsiloxane) (PDMS) is a common material used in fabricating microfluidic devices. The predominant PDMS fabrication method, soft lithography, relies on photolithography for fabrication of micropatterned molds. In this technical note, we report an alternative molding technique using microscale PLasma Activated Templating (μPLAT). The use of photoresist in soft lithography is replaced by patterned water droplets created using μPLAT. When liquid PDMS encapsulates patterned water and then solidifies, the cavities occupied by water become structures such as microchannels. Using this method, device fabrication is less time consuming, more cost efficient and flexible, and ideal for rapid prototyping. An additional important feature of the water-molding process is that it yields structural profiles that are difficult to achieve using photolithography.

Graphical abstract: Rapid fabrication of microchannels using microscale plasma activated templating (μPLAT) generated water molds

Supplementary files

Article information

Article type
Technical Note
Submitted
14 Dec 2006
Accepted
07 Feb 2007
First published
05 Apr 2007

Lab Chip, 2007,7, 641-643

Rapid fabrication of microchannels using microscale plasma activated templating (μPLAT) generated water molds

S. Chao, R. Carlson and D. R. Meldrum, Lab Chip, 2007, 7, 641 DOI: 10.1039/B618269K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements