Issue 17, 2010

Holey nanosheets by patterning with UV/ozone

Abstract

Self-assembled monolayers (SAMs) of 1,1′-biphenyl-4-thiol are patterned by using UV/ozone treatment through a shadow mask. After subsequent irradiation with low-energy electrons, the SAM is cross-linked to form a two-dimensional, holey nanosheet with a thickness of ∼1 nm. This nanosheet is mechanically stable and can be released from the original gold substrate and transferred to new substrates, including transmission electron microscopy (TEM) grids. The process is monitored by complementary microscopic techniques as well as X-ray photoelectron spectroscopy (XPS).

Graphical abstract: Holey nanosheets by patterning with UV/ozone

Article information

Article type
Paper
Submitted
12 Nov 2009
Accepted
14 Jan 2010
First published
17 Feb 2010

Phys. Chem. Chem. Phys., 2010,12, 4324-4328

Holey nanosheets by patterning with UV/ozone

C. T. Nottbohm, S. Wiegmann, A. Beyer and A. Gölzhäuser, Phys. Chem. Chem. Phys., 2010, 12, 4324 DOI: 10.1039/B923863H

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