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Paper
J. Mater. Chem., 2009, 19, 505 - 513, DOI: 10.1039/b816434g
Non-ionic photo-acid generators for applications in two-photon lithography
Lorenz Steidl, Shalin J. Jhaveri, Ramakrishnan Ayothi, Jing Sha, Jesse D. McMullen, Sin Yee Cindy Ng, Warren R. Zipfel, Rudolf Zentel and Christopher K. Ober
Non-ionic photoacid generators (PAGs) have been designed and synthesized for use in two-photon lithography (TPL). The chromophores in these new PAGs are covalently linked to the photocleavable group by a flexible joint. Their thermal stability, solubility and efficiency to produce acid under both one- and two-photon excitation were characterized. The potential of these PAGs for TPL was tested in two negative-tone resist systems relying on different mechanisms: free-radical/cationic polymerization or a cationically initiated cross-linking reaction. These PAGs needed lower threshold power for polymerization compared to a commercially available photoinitiator, isopropylthioxanthone, and a photoacid generator, N-hydroxynaphthalimide triflate. Microstructures with a resolution of 0.6 µm were fabricated and the threshold power for polymerization was found to be below 2 mW.
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