Issue 6, 2008
From the journal:

Soft Matter

Electrically curable double-layer polymer resist for dynamic nanoscale lithography†

Haixiong Ge,‡*a   Wenjiang Shena  and  Yong Chen*a  

* Corresponding authors

a Department of Mechanical and Aerospace Engineering, California NanoSystems Institute, University of California, Los Angeles, California 90095, USA
E-mail: yongchen@seas.ucla.edu, haixiong@nju.edu.cn

Abstract

A double-layer polymer resist composed of a top electrically curable resin layer with onium salt photo-acid generators and a bottom ionic conductive polymer transfer layer has been developed for dynamic nanoscale electric lithography. By applying an electric potential on the resist from conductive patterns on a mask, the acid generators under the conductive patterns are electrolyzed into proton acid, which consequently cross-links the cationically polymerizable resin resist. With the double-layer resist, nanopatterns can be generated with a sub-50 nm resolution. By applying different electric potentials on the individual conductive patterns on the mask, the transferred nanopatterns can be modified dynamically.

Graphical abstract: Electrically curable double-layer polymer resist for dynamic nanoscale lithography

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Article information

DOI
https://doi.org/10.1039/B801101J
Article type
Paper
Submitted
21 Jan 2008
Accepted
22 Feb 2008
First published
27 Mar 2008

Soft Matter, 2008,4, 1178-1182

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Electrically curable double-layer polymer resist for dynamic nanoscale lithography

H. Ge, W. Shen and Y. Chen, Soft Matter, 2008, 4, 1178 DOI: 10.1039/B801101J

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