Additions and corrections

Low-temperature water gas shift reaction on Cu/SiO₂ prepared by an atomic layer epitaxy technique

Ching-Shiun Chen,* Jarrn-Horng Lin and Tzu-Wen Lai

Chem. Commun., 2008, 4983–4985 (DOI: 10.1039/b807428c) Amendment published 23rd October 2008

In the original manuscript, the name of the final author was mistakenly given as Tzn-Wei Lai. The correct name of the final author is Tzu-Wen Lai.

The Royal Society of Chemistry apologises for this error and any consequent inconvenience to authors and readers.

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