Radio frequency sputter deposition
Definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The sign of the anode--cathode bias is varied at a high rate to avoid charge build-up on insulating targets.
ID: CMO:0001370
Synonyms:
More about the RSC Chemical Methods Ontology (CMO)
Articles referencing this term
Young-Eun Chang, Doo-Young Youn, Guy Ankonina, Dae-Jin Yang, Ho-Gi Kim, Avner Rothschild and Il-Doo Kim, Chem. Commun., 2009
, 4019
DOI: 10.1039/b902542a