Electron-beam sputter deposition
Definition: A synthesis technique where a solid target is bombarded with electrons causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate.
ID: CMO:0002283
Synonyms:
More about the RSC Chemical Methods Ontology (CMO)
Articles referencing this term
Florian Banhart, Nanoscale, 2009
, 1
, 201
DOI: 10.1039/b9nr00127a