Nanoscale: outstanding peer reviewers
Celebrating some of the individuals making significant contributions to the chemical sciences through peer review.
Every one of our peer reviewers makes a significant contribution to great science. Each year, our editorial team recognises peer reviewers who have gone above and beyond.
2024
Join us in celebrating our outstanding peer reviewers for 2024.
Professor Marta Maria Natile, Consiglio Nazionale delle Ricerche, ORCID 0000-0001-5591-2670
Dr Ligang Feng, Yangzhou University, ORCID 0000-0001-9879-0773
Professor Yun-Long Wu, Xiamen University, ORCID 0000-0001-6426-6340
Professor Tin Wui Wong, Universiti Teknologi Mara - Kampus Puncak Alam, ORCID 0000-0002-9131-6937
Dr Siby Thomas, Colorado School of Mines, ORCID 0000-0002-7928-4119
Dr Mengqi Sun, University of Washington, ORCID 0000-0002-3500-4189
Dr Gaël Ung, University of Connecticut, ORCID 0000-0002-6313-3658
Professor Peng Miao, Suzhou Institute of Biomedical Engineering and Technology, ORCID 0000-0003-3993-4778
Professor Xing Li, Chinese Academy of Sciences, ORCID 0000-0003-3149-9783
Dr Sheng-Bin Lei, School of Science of Tianjin University, ORCID 0000-0002-3142-5787
Professor Dongpeng Yan, Beijing University of Chemical Technology, ORCID 0000-0001-8261-154X
Professor Hong Jin Fan, Nanyang Technologicial University, ORCID 0000-0003-1237-4555
Professor Xijun Liu, Guangxi University, ORCID 0000-0002-2624-6901
Professor Baoying Dai, Nanjing Tech University, ORCID 0000-0003-1573-0279
Dr Bruno Rosa, Imperial College London, ORCID 0000-0001-8054-059X
Professor Joon Hak Oh, Seoul National University, ORCID 0000-0003-0481-6069
Dr Manuel Pernia Leal, Universidad de Sevilla, ORCID 0000-0001-8160-0574
Dr Makoto Nakagawa, Osaka Research Institute of Industrial Science and Technology, ORCID 0000-0003-1888-5030
Dr Dhruba Khadka, National Institute for Materials Science, ORCID 0000-0001-9134-3890
Previous years
Katsuhiko Ariga, National Institute for Materials Science & The University of Tokyo, ORCID 0000-0002-2445-2955
Weihua Chen, Zhengzhou University, ORCID 0000-0002-0548-330X
Ting Cheng, Peking University, ORCID 0000-0002-6204-2201
Abir De Sarkar, Institute of Nano Science and Technology, ORCID 0000-0001-5752-6589
Fei Ding, University of Southern Denmark, ORCID 0000-0001-7362-519X
Eva Hemmer, University of Ottawa, ORCID 0000-0002-9222-1219
Tobias Kraus, INM - Leibniz Institute for New Materials, ORCID 0000-0003-2951-1704
Bo Li, Kennesaw State University, ORCID 0000-0001-9407-9503
Zhiwei Li, Northwestern University, ORCID 0000-0002-1489-4506
Guiseppina Pace, The National Research Council of Italy (CNR) & Italian Institute of Technology, ORCID 0000-0003-1699-1825
Shenqiang Ren , University of Maryland, ORCID 0000-0002-9987-3316
Paolo Samori, University of Strasbourg, ORCID 0000-0001-6256-8281
Marinella Striccoli, CNR, ORCID 0000-0002-5366-691X
Reji Varghese, IISER Thiruvananthapuram, ORCID 0000-0001-9729-3425
Jianfang Wang, The Chinese University of Hong Kong, ORCID 0000-0002-2467-8751
Xiaojun Wu, University of Science and Technology of China, ORCID 0000-0003-3606-1211
Yusuke Yamauchi, The University of Queensland, ORCID 0000-0001-7854-927X
Yan Yan, Anhui University of Technology, ORCID 0000-0001-8786-903X
Huayan Yang, Shenzhen University, ORCID 0000-0002-8954-1414
Sung Jong Yoo, Korea Institute of Science and Technology, ORCID 0000-0003-0238-5971
Gang Zhang, Institute of High Performance Computing, A*STAR, ORCID 0000-0001-9812-8106
Shiqiang Zhao, Wenzhou University, ORCID 0000-0003-2820-9829
Stefania Castelletto, RMIT University, ORCID 0000-0002-8675-2291
Blanca del Rosal, RMIT University, ORCID 0000-0001-9174-8097
Ligang Feng , Yangzhou University, ORCID 0000-0001-9879-0773
Kristen Fichthorn, Pennsylvania State University, ORCID 0000-0002-4256-714X
Eva Hemmer, University of Ottawa, ORCID 0000-0002-9222-1219
Stephanie Law, Penn State University, ORCID 0000-0002-5087-6663
Roger Leblanc, Miami University, ORCID 0000-0001-8836-8042
Zhiqun Lin, National University of Singapore, ORCID 0000-0003-3158-9340
Yanwei Lum, National University of Singapore, ORCID 0000-0001-7261-2098
Christine Luscombe, Okinawa Institute of Science and Technology, ORCID 0000-0001-7456-1343
Alessandro Molle, CNR-IMM, ORCID 0000-0002-3860-4120
Svetlana Neretina, University of Notre Dame, ORCID 0000-0002-6889-4384
Wolfgang Parak, Universität Hamburg, ORCID 0000-0003-1672-6650
Michelle Personick, Wesleyan University, ORCID 0000-0003-4747-9429
Christopher Jay Torres Robidillo, University of the Philippines Manila, ORCID 0000-0001-6492-5107
Ping-Heng Tan, Institute of Semiconductors, Chinese Academy of Sciences, ORCID 0000-0001-6575-1516
Zuankai Wang, City University of Hong Kong, ORCID 0000-0002-3510-1122
Fujia Wang, Georgia Institute of Technology, ORCID 0000-0001-9617-6796
Yadong Yin, University of California Riverside, ORCID 0000-0003-0218-3042
Jana Zaumseil, Universität Heidelberg, ORCID 0000-0002-2048-217X
Zhicheng Zhang, Tianjin University, ORCID 0000-0002-2487-4250
Xiaolu Zhuo, The Chinese University of Hong Kong - Shenzhen, ORCID 0000-0002-5895-3336
Tierui Zhang, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, ORCID 0000-0002-7948-9413
Tierui Zhang, Technical Institute of Physics and Chemistry, ORCID 0000-0002-7948-9413
Jianfang Wang, The Chinese University of Hong Kong, ORCID 0000-0002-2467-8751
Tobias Kraus, Leibniz Institut for New Materials, ORCID 0000-0003-2951-1704
Alyxandra Thiessen, University of Alberta, ORCID 0000-0001-9978-1422
Andris Bakuzis, Universidade Federal de Goias Instituto de Fisica, ORCID 0000-0003-3366-106X
Zi Gu, University of New South Wales, ORCID 0000-0002-7153-6596
Jun Li, University of Wisconsin-Madison, ORCID 0000-0002-7498-6736
Sabrina Disch, University of Cologne, ORCID 0000-0002-4565-189X
Eva Hemmer, University of Ottawa, ORCID 0000-0002-9222-1219
Qiang Zhang, Tsinghua University, ORCID 0000-0002-3929-1541
Peng Huang, Shenzhen University, ORCID 0000-0003-3651-7813
Zhen Zhou, Nankai University, ORCID 0000-0003-3232-9903
Kanishka Biswas, Jawaharlal Nehru Centre for Advanced Scientific Research
Federico Locardi, Universita degli Studi di Genova, 000-ORCID 0002-1794-8282
Zhiqun Lin, Georgia Institute of Technology, ORCID 0000-0003-3158-9340
Zhipei Sun, Aalto-yliopisto, ORCID 0000-0002-9771-5293
Benjamin Diroll, Argonne National Laboratory, ORCID 0000-0003-3488-0213
Tian-Yi Luo, Johns Hopkins University, ORCID 0000-0002-9973-9328
Audrey Beaussart, University of Lorraine, ORCID 0000-0002-4602-3019
Raffaella Buonsanti, Ecole polytechnique federale de Lausanne, ORCID 0000-0002-6592-1869
Andres Castellanos-Gomez, Consejo Superior de Investigaciones Cientificas, ORCID 0000-0002-3384-3405
Katsuhiko Ariga, Busshitsu Zairyo Kenkyu Kiko
Hongjin Fan, Nanyang Technological University
Ligang Feng, Yangzhou University
Zhanhu Guo, The University of Tennessee Knoxville
Yanglong Hou, Peking University
Sang-Jae Kim, Jeju National University
Liangzhi Kou, Queensland University of Technology
Feng Liu, The University of Utah
Juewen Liu, University of Waterloo, ORCID 0000-0001-5918-9336
Xiong Wen (David) Lou, Nanyang Technological University
Alessandro Molle, Istituto per la Microelettronica e Microsistemi Consiglio Nazionale delle Ricerche, ORCID 0000-0002-3860-4120
Shizhang Qiao, The University of Adelaide, ORCID 0000-0002-4568-8422
Timon Rabczuk, Bauhaus-Universitat Weimar Institut fur Strukturmechanik
Haibo Shu, China Jiliang University
Anjali Singh, Centre for Study of Science Technology and Policy, ORCID 0000-0002-8990-4078
Yexiang Tong, Sun Yat-Sen University
Jianfang Wang, The Chinese University of Hong Kong
Liming Wang, Institute of High Energy Physics Chinese Academy of Sciences, ORCID 0000-0003-1382-9195
Aiguo Wu, Ningbo Institute of Industrial Technology Chinese Academy of Sciences, ORCID 0000-0001-7200-8923
Feng Xu, Xi'an Jiaotong University
Jiaguo Yu, Wuhan University of Technology
Qiang Zhang, Tsinghua University
Tierui Zhang, Technical Institute of Physics and Chemistry, ORCID 0000-0002-7948-9413
Han Zhang, Shenzhen University
Zhen Zhou, Nankai University, ORCID 0000-0003-3232-9903
Please note that we only list outstanding reviewers who have opted to have their names published in this recognition.
