Issue 30, 2008
From the journal:

Journal of Materials Chemistry

A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material

Hiroto Kudo,a   Daisuke Watanabe,a   Tadatomi Nishikubo,*a   Ken Maruyama,b   Daisuke Shimizu,b   Toshiyuki Kai,b   Tsutomu Shimokawab  and  Christopher K. Oberc  

* Corresponding authors

a Department of Material and Life Chemistry, Faculty of Engineering, Kanagawa University, 3-27-1, Rokkakubashi, Kanagawa-ku, Yokohama, 221-8686 Japan

b Semiconductor Materials Laboratory, Semiconductor Materials Research Laboratories, JSR Corporation, 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan

c Department of Materials Science and Engineering, Cornell University, Bard Hall, Ithaca, NY 14853, USA

Abstract

A novel ladder-type cyclic oligomer (molecular water-wheel = noria) derivative containing t-butyl ester groups was synthesized. This derivative (noria-COOtBu) had good thermal stability, good solubility in common organic solvents, and good film-forming ability. The photo-induced deprotection (UV irradiation for 30 min followed by heating at 130 °C) of films of noria-COOtBu was examined in the presence of a photo-acid generator, and it was found that deprotection of the t-butyl groups proceeded smoothly to give the corresponding carboxylic acid derivative (noria-COOH). Furthermore, when noria-COOtBu(71) (ratio of t-butyl ester groups: 71%) was examined as an electron-beam resist material, a clear line and space pattern was obtained at a resolution of 70 nm.

Graphical abstract: A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material

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Article information

DOI
https://doi.org/10.1039/B805394D
Article type
Paper
Submitted
31 Mar 2008
Accepted
23 May 2008
First published
30 Jun 2008

J. Mater. Chem., 2008,18, 3588-3592

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A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material

H. Kudo, D. Watanabe, T. Nishikubo, K. Maruyama, D. Shimizu, T. Kai, T. Shimokawa and C. K. Ober, J. Mater. Chem., 2008, 18, 3588 DOI: 10.1039/B805394D

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