Issue 39, 2009
From the journal:

Journal of Materials Chemistry

Thermally stable and solvent resistant honeycomb structured polystyrene films via photochemical cross-linking

Lei Li,*a   Yawen Zhong,a   Jian Li,a   Caikang Chen,a   Aijuan Zhang,a   Jin Xu*a  and  Zhi Ma*b  

* Corresponding authors

a College of Materials, Xiamen University, Xiamen, P. R. China
E-mail: lilei@xmu.edu.cn
Fax: +86-592-2183937
Tel: +86-592-2186296

b Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, Shanghai, P. R. China

Abstract

In this article, a facile static breath-figure (BF) method to prepare highly ordered polystyrene (PS) thin films was reported. The static process was robust and tolerated more variability in casting conditions, although non-polar linear PS was not believed to be a good candidate for the BF technique. In the following UV irradiation, not only were the microporous structures well preserved, but also thermal and chemical resistance of the films was significantly improved due to the cross-linkage. Moreover, the surface wettability was changed from hydrophobicity to hydrophilicity. The cross-linked honeycomb structured PS films became resistant to a wide range of organic solvents and thermally stable up to 250 °C, an increase of more than 150 K as compared to the uncross-linked films. The simple cross-linking operation opened the door to facilely fabricate robust and low-cost microporous polymer films.

Graphical abstract: Thermally stable and solvent resistant honeycomb structured polystyrene films via photochemical cross-linking

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Article information

DOI
https://doi.org/10.1039/B911714H
Article type
Paper
Submitted
15 Jun 2009
Accepted
28 Jul 2009
First published
20 Aug 2009

J. Mater. Chem., 2009,19, 7222-7227

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Thermally stable and solvent resistant honeycomb structured polystyrene films via photochemical cross-linking

L. Li, Y. Zhong, J. Li, C. Chen, A. Zhang, J. Xu and Z. Ma, J. Mater. Chem., 2009, 19, 7222 DOI: 10.1039/B911714H

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